Vacuum coating cluster

Thin film production

The SAF 25/50 multifunctional R&D cluster tool is intended for research and development works as well as for feasibility studies and more general academic work in the field of thin film technologies.

The tool is a multifunctional, expandable, modular and flexible system. The tool comprises an input/output chamber with ion gun, central substrate transfer chamber with radial telescopic transport arm and up to 7 deposition chambers. Substrate is positioned horizontally on a holder. Deposition zones are configured for substrate rotation or displacement during upward deposition.

Tool multifunctionality and flexibility is founded on the following key features:

• each chamber can operate independently due to individual pumping means, controls and utility connections (deposition chambers and deposition sources are interchangeable);
• the central transfer chamber prevents process cross-contamination and ensures substrate transfer without venting of the chambers;
• various types of deposition sources including sublimation thermal cells, resistive boats, crucibles and sputter magnetrons can be integrated;
• twin, single and dual sputter magnetrons can be powered by DC, pulsed DC, MF and RF power supplies (contact and contactless cooling and heating of the substrate is offered);
• glove box for substrate loading in inert gas atmosphere and substrate magazine can be added;
• preliminary agreed number of blanked-off flanges installed on the chambers allows attaching customized instrumentation and technological accessories;
• basic configuration of the pumping system includes turbomolecular and two-stage dry mechanical pumps (the control system can operate in a semi-automatic and manual mode).

Specification:

• substrate: glass, metal, plastic, ceramic;
• substrate size: 25 x 25 or 50 x 50 mm;
• substrate temperature: – 40 … + 400 ^oC (depends on the process);
• base pressure: 1x 10-7 Torr;
• installed power: 50 kW.